On December 25th, the Hefei Economic Development Zone Management Committee announced that the first domestic non-mask (direct write) "lithography machine" with world-leading level and completely independent intellectual property rights was successfully developed in Hefei. It marks that the situation that China's sub-micron lithography machine is completely dependent on imports has been broken.
According to reports, the lithography machine project is a major high-end because it is the most critical equipment for the production of electronic chips, used to manufacture integrated circuit patterns on electronic components. At the same time, China is the world's largest consumer of integrated circuits. According to statistics, integrated circuits account for more than 24% of the world's total, but the self-sufficiency rate of domestic integrated circuits in the domestic market is less than 10%. Therefore, the lithography machine was adopted by the national "Eleventh Five-Year Plan". The development plan is clearly defined as the key manufacturing equipment. It is understood that the maskless (direct write) lithography machine has a resolution of 0.65 micron and can be applied to different fields such as semiconductor industry, biology, medicine, optoelectronics, solar cells, new energy and thin film circuits.
According to the development of the product of the core semiconductor (China) Co., Ltd., after the project settled in Hefei, starting from December 2006, it took only one year to develop the first equipment. According to the plan, the company will carry out large-scale production after that, and the first phase of the project will be officially completed in September next year.
According to reports, the lithography machine project is a major high-end because it is the most critical equipment for the production of electronic chips, used to manufacture integrated circuit patterns on electronic components. At the same time, China is the world's largest consumer of integrated circuits. According to statistics, integrated circuits account for more than 24% of the world's total, but the self-sufficiency rate of domestic integrated circuits in the domestic market is less than 10%. Therefore, the lithography machine was adopted by the national "Eleventh Five-Year Plan". The development plan is clearly defined as the key manufacturing equipment. It is understood that the maskless (direct write) lithography machine has a resolution of 0.65 micron and can be applied to different fields such as semiconductor industry, biology, medicine, optoelectronics, solar cells, new energy and thin film circuits.
According to the development of the product of the core semiconductor (China) Co., Ltd., after the project settled in Hefei, starting from December 2006, it took only one year to develop the first equipment. According to the plan, the company will carry out large-scale production after that, and the first phase of the project will be officially completed in September next year.
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